| 摘要 |
Provided are a substrate cleaning composition including a fluoride compound, an inorganic acid, and deionized water, and a method of forming a gate using the same. The fluoride compound is one of HF, NH<SUB>4</SUB>F, and a combination thereof, and the inorganic acid is one of HNO<SUB>3</SUB>, HCl, HCIO<SUB>4</SUB>, H<SUB>2</SUB>SO<SUB>4</SUB>, or H<SUB>5</SUB>IO<SUB>6</SUB>. The substrate cleaning composition removes polymer by-products generated by etching a metal layer for forming a gate, but not other layers.
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