发明名称 Pattern Testing Apparatus, Pattern Testing Method, and Pattern Testing Program
摘要 The present invention has an object of realizing a defect inspection estimated at high accuracy by preparing a reference image that reflects the change of the blur with time from a sampled image and design data. The present invention comprises a point spread function estimating section 23 for estimating a point spread function from an observation image and design information, a convolution image generating section 31 for generating a convolution image by convoluting the point spread function relative to the design information and a reference image generating section 33 for generating a reference image from the convolution image obtained by the convolution image generating section. binary image relative to "chromium on quartz glass"
申请公布号 US2008162061(A1) 申请公布日期 2008.07.03
申请号 US20050718548 申请日期 2005.11.04
申请人 NEC CORPORATION 发明人 MIYANO HIROYOSHI
分类号 G06F19/00;G03F1/00 主分类号 G06F19/00
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