发明名称 METHOD OF CHECKING THE FACTOR OF GENERATING GROWABLE RESIDUE IN PHOTOMASK
摘要 <p>A method for checking the factors generating foreign materials of a photo mask is provided to estimate the life time of growable foreign material generation due to a layer adhesive agent by measuring and analyzing the generation of growable foreign material. A photo mask on which a pellicle is mounted, is loaded into a haze accelerating apparatus(110). A light is irradiated onto a rear of the photo mask to generate a growable foreign material(120). The photo mask of which the growable foreign material is generated is unloaded from the haze accelerating apparatus(130). The growable foreign material of the unloaded photo mask is observed(140). The light is accelerated and irradiated to a layer adhesive agent for attaching the photo mask to a pellicle.</p>
申请公布号 KR20080062747(A) 申请公布日期 2008.07.03
申请号 KR20060138836 申请日期 2006.12.29
申请人 HYNIX SEMICONDUCTOR INC. 发明人 LEE, JUN SIK
分类号 H01L21/027 主分类号 H01L21/027
代理机构 代理人
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