发明名称 SUBSTRATE TRANSFER APPARATUS AND SUBSTRATE TESTING APPARATUS
摘要 <p><P>PROBLEM TO BE SOLVED: To shorten a time required for transferring a substrate in a substrate transfer apparatus for transferring a substrate such as a wafer by rotary motion. <P>SOLUTION: In the wafer transfer apparatus 30 which is a substrate transfer apparatus for transferring a wafer W, three transfer arms 32 are extended radially from a rotary shaft 31. Each transfer arm 32 is attached with a hand 33 for holding the wafer W. In the main body 35 of each hand, fixing portions 38 are so attached as to cover holes 37 penetrated therein. By moving down the transfer arm 32 and inserting pins 42 into the holes 37, the fixing portions 38 are pushed by the pins 42 to recede from the wafer W. When the transfer arm 32 is moved up, the pins 42 slip out of the holes and the fixing portions 38 position and hold the wafer W. <P>COPYRIGHT: (C)2008,JPO&INPIT</p>
申请公布号 JP2008153353(A) 申请公布日期 2008.07.03
申请号 JP20060338307 申请日期 2006.12.15
申请人 OLYMPUS CORP 发明人 TOKITA HIROYUKI
分类号 H01L21/683;H01L21/66 主分类号 H01L21/683
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