发明名称 |
Dopant confinement in the delta doped layer using a dopant segregation barrier in quantum well structures |
摘要 |
A device grade III-V quantum well structure and method of manufacture is described. Embodiments of the present invention enable III-V InSb quantum well device layers with defect densities below 1x10<SUP>8 </SUP>cm<SUP>-</SUP>2 to be formed. In an embodiment of the present invention, a delta doped layer is disposed on a dopant segregation barrier in order to confine delta dopant within the delta doped layer and suppress delta dopant surface segregation.
|
申请公布号 |
US2008157058(A1) |
申请公布日期 |
2008.07.03 |
申请号 |
US20060647989 |
申请日期 |
2006.12.29 |
申请人 |
HUDAIT MANTU K;BUDREVICH AARON A;LOUBYCHEV DMITRI;KAVALIEROS JACK T;DATTA SUMAN;FASTENAU JOEL M;LIU AMY W K |
发明人 |
HUDAIT MANTU K.;BUDREVICH AARON A.;LOUBYCHEV DMITRI;KAVALIEROS JACK T.;DATTA SUMAN;FASTENAU JOEL M.;LIU AMY W. K. |
分类号 |
H01L29/06;H01L21/04 |
主分类号 |
H01L29/06 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|