发明名称 Laser irradiation apparatus and method of manufacturing semiconductor device
摘要 The transmissivity of an ftheta lens which is used as a means for converging laser light differs in the center and in the edge thereof. As a result, when the ftheta lens is used as it is with the purpose of crystallizing by laser irradiation, energy distribution of the laser light which is irradiated on the semiconductor film is not uniform so that the whole surface of the semiconductor film could not be irradiated uniformly. Therefore, the present invention provides a laser irradiation apparatus including a galvanometer mirror and an ftheta lens that can offset the change of the energy due to the change of transmissivity of the ftheta lens and can scan the laser light while controlling the change of the energy on the object to be irradiated. Moreover, the invention provides a manufacturing method of a semiconductor device including the laser irradiation apparatus described above.
申请公布号 US2008157008(A1) 申请公布日期 2008.07.03
申请号 US20070812529 申请日期 2007.06.19
申请人 SEMICONDUCTOR ENERGY LABORATORY CO., LTD. 发明人 TANAKA KOICHIRO
分类号 G21K5/10;B23K26/073;B23K26/08;H01L21/20 主分类号 G21K5/10
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