发明名称 STAGE APPARATUS, EXPOSURE APPARATUS AND DEVICE MANUFACTURING METHOD
摘要 A stage apparatus is provided with a fixed section (16) having a prescribed moving surface (16a), and a first moving body which can move along the moving surface (16a) in a plurality of directions including a first direction. The stage apparatus is also provided with substages (61A, 61B) which move in a first direction to the moving surface (16a) in synchronization with movement of the first moving body; a first measuring apparatus (67), which is arranged on the substages (61A, 61B) at least partially and detects information relating to relative position in the first direction between the substages (61A, 61B) and the moving surface (16a); and second measuring apparatuses (71, 72), which are arranged on the substages (61A, 61B) at least partially and detect information relating to relative position in a second direction which substantially orthogonally intersects with the first direction between the substage and the first moving body and is along the moving surface (16a).
申请公布号 WO2008078688(A1) 申请公布日期 2008.07.03
申请号 WO2007JP74673 申请日期 2007.12.21
申请人 NIKON CORPORATION;ONO, KAZUYA 发明人 ONO, KAZUYA
分类号 H01L21/027;H01L21/68 主分类号 H01L21/027
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