发明名称 METHOD FOR DETERMINING DISTANCE OF HEAT SHIELD AND MANUFACTURING APPARATUS OF SILICON SINGLE CRYSTAL INGOT USING THE SAME
摘要 A method of determining the distance of a heat shield and an apparatus of manufacturing a silicon single crystal ingot using the same are provided to improve a yield by adjusting a distance between the heat shield and the silicon single crystal ingot. A furnace(20) is installed in a chamber(10), and is filled with a silicon solution(SM). The furnace is heated by a heater(40). A heat shield(50) is interposed between silicon single crystal ingot and the furnace to shield the heat emitted from the heater and the silicon solution. A horizontal distance between the heat shield and the silicon single crystal ingot is determined under a condition in that a vertical temperature gradient between an interface of the silicon solution and the silicon single crystal ingot is maximized.
申请公布号 KR20080061718(A) 申请公布日期 2008.07.03
申请号 KR20060136728 申请日期 2006.12.28
申请人 SILTRON INC. 发明人 LEE, JAE EUN;LEE, SANG HUN
分类号 C30B15/10 主分类号 C30B15/10
代理机构 代理人
主权项
地址