发明名称 |
METHOD FOR DETERMINING DISTANCE OF HEAT SHIELD AND MANUFACTURING APPARATUS OF SILICON SINGLE CRYSTAL INGOT USING THE SAME |
摘要 |
A method of determining the distance of a heat shield and an apparatus of manufacturing a silicon single crystal ingot using the same are provided to improve a yield by adjusting a distance between the heat shield and the silicon single crystal ingot. A furnace(20) is installed in a chamber(10), and is filled with a silicon solution(SM). The furnace is heated by a heater(40). A heat shield(50) is interposed between silicon single crystal ingot and the furnace to shield the heat emitted from the heater and the silicon solution. A horizontal distance between the heat shield and the silicon single crystal ingot is determined under a condition in that a vertical temperature gradient between an interface of the silicon solution and the silicon single crystal ingot is maximized.
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申请公布号 |
KR20080061718(A) |
申请公布日期 |
2008.07.03 |
申请号 |
KR20060136728 |
申请日期 |
2006.12.28 |
申请人 |
SILTRON INC. |
发明人 |
LEE, JAE EUN;LEE, SANG HUN |
分类号 |
C30B15/10 |
主分类号 |
C30B15/10 |
代理机构 |
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代理人 |
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主权项 |
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