发明名称 |
Lithographic apparatus, device manufacturing method and computer program product |
摘要 |
In a lithographic apparatus, a corrective irradiation procedure is performed using an illumination mode arranged so as to heat a selected part of an element of the projection system near a pupil plane thereof that is relatively unheated during production exposure. The corrective irradiation procedure aims to improve uniformity of optical element heating of the projective system and/or to reduce a phase gradient.
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申请公布号 |
US2008158528(A1) |
申请公布日期 |
2008.07.03 |
申请号 |
US20070984837 |
申请日期 |
2007.11.21 |
申请人 |
ASML NETHERLANDS B.V. |
发明人 |
STOELDRAIJER JUDOCUS MARIE DOMINICUS;LOOPSTRA ERIK ROELOF;MULDER HEINE MELLE;SENGERS TIMOTHEUS FRANCISCUS;STOFFELS FREERK ADRIAAN;JORRITSMA LAURENTIUS CATRINUS;JUNGBLUT REINER MARIA |
分类号 |
G03B27/42;G03B27/68 |
主分类号 |
G03B27/42 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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