| 摘要 |
<p>The present invention relates to an apparatus and method for forming a thin metal film, in which holes are formed in an upper insulating layer using a laser and a thin metal film is formed between the holes when the metal pattern of a liquid crystal display is open, thus connecting disconnected portions of the open metal pattern. The thin metal film formation method connects disconnected portions of an open metal pattern when a metal pattern (41) deposited on a substrate is open. An insulating layer on the metal pattern is eliminated by radiating first laser light, and first and second contact holes (44), on which a thin film can be deposited, are formed in the metal pattern. The contact holes are filled with a thin metal film (46) by radiating second laser light. A thin metal film is formed between the holes by radiating second laser light.</p> |
