| 摘要 |
<p>Exposure equipment is provided to selectively adjust the aspect ratio of a two-dimensional island-type pattern by transmitting a light source formed by a quadrapole DOE(diffractive optical element) to first and second linear polarization plates wherein the polarization angle of the second linear polarization plate with respect to the X-axis or Y-axis direction is varied to adjust the intensity of diffraction light in the X-axis or Y-axis direction. Exposure equipment including a quadrapole DOE has a first linear polarization plate and a second linear polarization plate having a different polarization angle from that of the first linear polarization plate. The first and second linear polarization plates are sequentially formed in the progression direction of a light source. The first linear polarization plate can linearly be polarized in the X-axis or Y-axis direction. The exposure equipment can be designed to adjust the polarization angle of the second linear polarization plate.</p> |
