| 摘要 |
<p>An exposure apparatus (EX) is provided for exposing a substrate (P) by irradiating the substrate with exposure light (EL). The exposure apparatus is provided with an optical element (LS1) having a recessed surface (2) for applying the exposure light; a supply port (12) arranged on an object (4), which can face the recessed surface, for supplying a space between the recessed surface and the object with a liquid; and a suction port (22), which is arranged on the object and sucks a fluid between the recessed surface and the object.</p> |
