BATCH TYPE THIN FILM DEPOSITION APPARATUS

摘要

A batch type thin film deposition apparatus is provided to deposit a film under the appropriate temperature for a characteristic of the film by configuring a heater out of more than two lamps which are capable of controlling the temperature respectively. A semiconductor substrate(10) is mounted on a substrate supporting unit(20). A rotary unit rotates the substrate supporting unit. A supply line supplies a gas necessary for deposition into a deposition apparatus. A temperature control unit is disposed at the lower part of the substrate supporting unit, and comprises more than two heaters(50) which are capable of controlling the temperature respectively, so as to deposit more than two kinds of multi layers according to the deposition temperature. An exhaust outlet exhausts various byproducts and gas supplied into the deposition apparatus.