发明名称 APPARATUS OF ALIGNERING SUBSTRATE, APPARATUS OF TREATING SUBSTRATE AND METHOD OF TREATING THE SAME
摘要 A substrate alignment apparatus, a substrate processing apparatus and a substrate processing method are provided to predict a substrate transfer time accurately by cooling the substrate properly regardless of a process. An alignment unit(410) aligns substrates in a predetermined direction. A temperature measuring unit(420) measures the temperature of the aligned substrates. A cooling unit(430) controls the temperature of the substrates. A control unit(450) controls the cooling unit to control the temperature of the substrates. Wherein, the temperature measuring unit is an infrared camera.
申请公布号 KR20080060747(A) 申请公布日期 2008.07.02
申请号 KR20060135206 申请日期 2006.12.27
申请人 SEMES CO., LTD. 发明人 YANG, JUN HYEOK;LEE, KI YUNG
分类号 H01L21/68 主分类号 H01L21/68
代理机构 代理人
主权项
地址