发明名称 ANTIMONY-FREE PHOTOCURABLE RESIN COMPOSITION AND THREE DIMENSIONAL ARTICLE
摘要 The present invention provides a low viscosity photocurable composition including (i) a cationically curable component (ii) a free radically active component (iii) an antimony-free cat ionic photoinitiator and (v) a free radical photoinitiator. The photocurable composition can be cured using rapid prototyping techniques to form three-dimensional articles which can be used in various aerospace and investment casting applications.
申请公布号 KR20080061383(A) 申请公布日期 2008.07.02
申请号 KR20087010159 申请日期 2006.10.26
申请人 HUNTSMAN ADVANCED MATERIALS(SWITZERLAND) GMBH 发明人 FONG JOHN WAI;LEYDEN RICHARD;MESSE LAURENCE;PATEL RANJANA C.;CHAPELAT CAROLE
分类号 G03F7/028 主分类号 G03F7/028
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