发明名称 |
ANTIMONY-FREE PHOTOCURABLE RESIN COMPOSITION AND THREE DIMENSIONAL ARTICLE |
摘要 |
The present invention provides a low viscosity photocurable composition including (i) a cationically curable component (ii) a free radically active component (iii) an antimony-free cat ionic photoinitiator and (v) a free radical photoinitiator. The photocurable composition can be cured using rapid prototyping techniques to form three-dimensional articles which can be used in various aerospace and investment casting applications. |
申请公布号 |
KR20080061383(A) |
申请公布日期 |
2008.07.02 |
申请号 |
KR20087010159 |
申请日期 |
2006.10.26 |
申请人 |
HUNTSMAN ADVANCED MATERIALS(SWITZERLAND) GMBH |
发明人 |
FONG JOHN WAI;LEYDEN RICHARD;MESSE LAURENCE;PATEL RANJANA C.;CHAPELAT CAROLE |
分类号 |
G03F7/028 |
主分类号 |
G03F7/028 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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