| 摘要 |
A cleaning solution for electronic materials is provided to realize excellent cleaning activity particularly in the field of cleaning of semiconductors, such as silicon wafers, in a cost-efficient manner. A cleaning solution for electronic materials comprises an aqueous liquid comprising microbubbles generated by hydrogen gas and subjected to ultrasonic vibration. The aqueous liquid includes ultrapure water or hydrogenated water. A process for cleaning an electronic material is carried out in an aqueous liquid containing hydrogen microbubbles under the irradiation of ultrasonic waves. |
