METHOD OF SOLVING MASK PHOTOGRAPHY AND IMAGE FORMING METHOD USING THE SAME

摘要

A method for solving a mask photography and an image forming method using the same are provided to secure the same calculation accuracy as the electromagnetic field analysis while maintaining the same performance time as the Kirchhoff method. A first electric field is obtained by using the Kirchhoff method without considering a pitch between features formed on a mask. A second electric field is obtained by the electromagnetic field analysis considering the pitch. A final electric field is determined on a pupil surface of a projection lens by combining the first and the second electric field. The process for obtaining the second electric field includes a process for determining the initial incident light of the mask as one of normal incidence or oblique incidence.