A unit pixel of a CMOS(complementary metal oxide semiconductor) image sensor is provided to reduce the pitch size of a pixel itself by forming a unit pixel composed of only NMOS and PMOS. An NMOS(110) is formed on a semiconductor substrate doped with impurities of a first conductivity type to receive light and generate an electrical signal. A PMOS(120) outputs a signal received from the NMOS, including a well doped with impurities of a second conductivity type. The gate and the body of the NMOS can be floated. The NMOS can include a ground connection part formed of the same impurity type as the body so as to be connected to the ground.
申请公布号
KR20080061060(A)
申请公布日期
2008.07.02
申请号
KR20060135846
申请日期
2006.12.28
申请人
KOREA ELECTRONICS TECHNOLOGY INSTITUTE
发明人
PARK, KWANG SUE;CHUNG, MIN JAE;KIM, SANG JIN;JO, YOUNG CHANG;KIM, HOON