| 摘要 |
An apparatus and a method for washing a substrate are provided to monitor the injection state of the apparatus at real time and to prevent the badness from generating in advance. A substrate is seated on a moving stage(110). An injector(130) is located at the upper portion of the moving stage, moved from a side to the other side of the moving stage and has nozzles for injecting the deionized water on the substrate. Plural sensors(150) are mounted to both ends of the injector and senses the existence of the injection of the deionized water injected from the nozzles. A controller(160) controls an operation of the injector according to the result sensed by plural sensors. Each sensor includes a transmitting member located at an end of the injector and for receiving the light signal. A receiving member is located oppositely to the transmission member and receives the light signal transmitted from the transmission member. |
