发明名称 SEMICONDUCTOR THIN FILM AND PROCESS FOR PRODUCING THE SAME
摘要 <p>This invention provides a transparent oxide semiconductor, which comprises an oxide comprising indium oxide as a main component and cerium oxide as an additive and has such properties that light-derived malfunction does not occur, there is no variation in specific resistance of a thin film caused by heating and the like, and the mobility is high, and a process for producing the same. A semiconductor thin film characterized by comprising indium oxide and cerium oxide and being crystalline and having a specific resistance of 10 +1 to 10 +8 © cm is used. This semiconductor thin film has no significant change in specific resistance and has high mobility. Accordingly, an element having improved switching properties can be provided by constructing a switching element using this semiconductor film.</p>
申请公布号 EP1939319(A1) 申请公布日期 2008.07.02
申请号 EP20060782427 申请日期 2006.08.07
申请人 IDEMITSU KOSAN CO., LTD. 发明人 INOUE, KAZUYOSHI;YANO, KOUKI;TANAKA, NOBUO
分类号 C23C14/08;C01G15/00;H01L21/363 主分类号 C23C14/08
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