发明名称 |
COMPOSITION FOR ANTIREFLECTION FILM FORMATION, COMPRISING PRODUCT OF REACTION BETWEEN ISOCYANURIC ACID COMPOUND AND BENZOIC ACID COMPOUND |
摘要 |
<p>There is provided anti-reflective coating forming composition containing a reaction product of an isocyanuric acid compound having two or three 2,3-epoxypropyl groups with a benzoic acid compound. The anti-reflective coating obtained from the composition has a high preventive effect for reflected light, causes no intermixing with photoresists, can form a photoresist pattern having no footing at the lower part, and can use in lithography process by use of a light such as ArF excimer laser beam and F2 excimer laser beam, etc.</p> |
申请公布号 |
EP1939688(A1) |
申请公布日期 |
2008.07.02 |
申请号 |
EP20050788391 |
申请日期 |
2005.09.27 |
申请人 |
NISSAN CHEMICAL INDUSTRIES, LTD. |
发明人 |
KISHIOKA, TAKAHIRO;SAKAMOTO, RIKIMARU;MARUYAMA, DAISUKE |
分类号 |
G03F7/11;H01L21/027 |
主分类号 |
G03F7/11 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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