| 摘要 |
<p>An overlay vernier and a method of forming a vernier pattern using the same are provided to prevent exfoliation of an overlay vernier pattern by increasing a contact area between a wafer and the overlay vernier pattern. An overlay vernier(10) comprises a light shielding layer(12A), and a light transmitting layer(14) which is formed within the light shielding layer as a quadrate structure. Wherein, the light shielding layer is made of Cr, and the light transmitting layer is made of a quartz substrate(11).</p> |
