发明名称 SUBSTRATE ALIGNING SYSTEM AND APPARATUS FOR CLEANING SUBSTRATE HAVING IT
摘要 A substrate alignment system and a substrate cleaning device are provided to prevent damage to a substrate and the collision between a cleaning bath and a transfer device by calculating a matching position of a substrate pedestal easily. A case unit comprises a substrate pedestal(110) and a first sensing device. A substrate transfer unit is disposed on the case unit, and comprises a transfer tool and a second sensing device. The transfer tool settles the substrate on the substrate pedestal by supporting and transferring the substrate. The second sensing device senses an alignment position of the transfer tool, and is disposed corresponding to the first sensing unit.
申请公布号 KR20080060626(A) 申请公布日期 2008.07.02
申请号 KR20060134963 申请日期 2006.12.27
申请人 K.C.TECH CO., LTD. 发明人 PARK, HWAN
分类号 H01L21/68;H01L21/304 主分类号 H01L21/68
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