发明名称 TREATING LIQUID SUPPLY APPARATUS AND FACILITY FOR TREATING SUBSTRATE WITH THE APPARATUS
摘要 A treating liquid supply device and a substrate treating apparatus are provided to enable a nozzle to spray the treating liquid at a constant temperature by maintaining a constant temperature of the treating liquid. A treating liquid supply device includes a treating liquid storage tank, a treating liquid supply line, and a nozzle(110). The treating liquid storage tank stores the treating liquid. The treating liquid supply line supplies the treating liquid from a treating liquid circulating line. The nozzle receives the treating liquid from the treating liquid supply line and sprays the treating liquid. The nozzle includes a supply tube(112) and first and second housings(114,116). The first housing is formed to surround an exterior of the supply tube and provides a space for containing constant temperature water therein. The second housing is arranged to surround an exterior of the first housing and provides a recollecting space for the constant temperature water, which is supplied to the first housing.
申请公布号 KR20080060787(A) 申请公布日期 2008.07.02
申请号 KR20060135282 申请日期 2006.12.27
申请人 SEMES CO., LTD. 发明人 PARK, KEUN YOUNG
分类号 H01L21/304 主分类号 H01L21/304
代理机构 代理人
主权项
地址