发明名称 Delamination reduction between vias and conductive pads
摘要 Vias and conductive pads configured and coupled in a manner to reduce delamination are described herein. The via and the conductive pads may be located in a substrate such as a carrier substrate, a die, or a printed circuit board.
申请公布号 US7394159(B2) 申请公布日期 2008.07.01
申请号 US20050066705 申请日期 2005.02.23
申请人 INTEL CORPORATION 发明人 GOTO HIDEKI;KOHMURA TOSHIMI
分类号 H01L23/48;H01L23/52 主分类号 H01L23/48
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