发明名称 |
Temperature conditioned load lock, lithographic apparatus comprising such a load lock and method of manufacturing a substrate with such a load lock |
摘要 |
A load lock for a lithographic apparatus is arranged to transfer an object, like a substrate, into and from the lithographic apparatus. The load lock outer wall defining at least part of a load lock volume accommodating a support unit for supporting the object when in the load lock. The load lock also has a temperature conditioned structure to control the temperature of the object to a desired temperature at least before the object is transferred from the load lock towards the lithographic projection apparatus.
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申请公布号 |
US7394520(B2) |
申请公布日期 |
2008.07.01 |
申请号 |
US20040797608 |
申请日期 |
2004.03.11 |
申请人 |
ASML NETHERLANDS B.V. |
发明人 |
KLOMP ALBERT JAN HENDRIK;HOOGKAMP JAN FREDERIK;VISSER RAIMOND;VUGTS JOSEPHUS CORNELIUS JOHANNES ANTONIUS;VULLINGS HENRICUS JOHANNES LOUIS MARIE;KUIPERS LEO WILHELMUS MARIA;FRANSSEN JOHANNES HENDRIKUS GERTRUDIS |
分类号 |
G03B27/52;H01L21/027;G03B27/42;G03F7/20;H01L21/68 |
主分类号 |
G03B27/52 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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