| 摘要 |
The present invention provides a method of fabricating a microlens, comprising providing a substrate with at least a dielectric layer thereon, forming a first thin film on the dielectric layer surface, etching the first thin film to form at least a micro bump, and forming a second thin film on the micro bump surface and dielectric layer surface, wherein the second thin film and the micro bump form the microlens. The present invention microlens can be applied in the environment with high temperature, and a passivation layer is not required for the present invention microlens.
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