发明名称 Method and apparatus for inspecting patterns
摘要 When the electrode potential of a charge control electrode above a wafer is reduced, image brightness is reduced. A point of change in the image brightness is a switching point between a positively charged state of the image and a negatively charged state of the image, showing the weakly charged state of the image. By setting this point of change as an inspecting condition, the amount of electric charges on the surface of the wafer can be reduced, and stable wafer inspection can be performed. It is estimated that an applied voltage V 1 in FIG. 14 corresponds to the point of the change and is roughly included in the voltage range of a region enclosed by a broken line in the vicinity of the applied voltage V 1 . Within this voltage range, the influence of charge on an inspection under the inspecting condition can be reduced.
申请公布号 US7394070(B2) 申请公布日期 2008.07.01
申请号 US20050314020 申请日期 2005.12.22
申请人 HITACHI HIGH-TECHNOLOGIES CORPORATION 发明人 NOZOE MARI;GOTO YASUNORI;CHENG ZHAOHUI
分类号 G01N23/00;G21K5/10;G21K7/00 主分类号 G01N23/00
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