| 摘要 |
<p>An imprint mask and a method of manufacturing a microlens for an image sensor using the same are provided to increase a light condensing efficiency of an image sensor by forming the microlens with a normal dome. A first photoresist pattern(102) is formed on a quartz(101), and then the quartz is etched by using the first photoresist pattern as an etch barrier. After that, the first photoresist pattern is removed. A second photoresist pattern is formed on the quartz so as to apply a damascene process, and then the quartz is etched by using the second photoresist pattern. After that, the second photoresist pattern is removed. A third photoresist pattern is formed on the quartz, and then the quartz is etched by using the third photoresist pattern. After that, the third photoresist pattern is removed to obtain the embossed or depressed quartz.</p> |
