| 摘要 |
An exhaust apparatus of a process chamber for manufacturing a semiconductor device is provided to exhaust contaminants completely by maintaining proper pressure inside an exhaust tube. An exhaust apparatus of a process chamber includes a plurality of vacuum pumps which are installed on an exhaust tube(210). The exhaust tube is extended from a process chamber to the outside in order to exhaust contaminants generated in the process chamber. A rotating force application unit, a fan(220) having an impeller(220a), applies rotating force to exhaust flow of the contaminants in order to prevent the exhausted contaminants from being stuck on the inner wall of the exhaust tube.
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