发明名称 VAPORDEPOSITION SOURCE SCANING APPAUATUS
摘要 A vapor deposition source scanning apparatus is provided to minimize generation of a particle and form a uniform thin film on a substrate by linearly moving the vapor deposition source. A vapor deposition source scanning apparatus(30) includes an arm unit and a driving unit(31). The arm unit has at least one articulation and the vapor deposition source is coupled to a front end of the arm unit. The driving unit linearly moves the vapor deposition source coupled to the arm unit. A sealing unit is installed on an outer circumferential surface of the articulation. The arm unit and the driving unit are provided by one pair to interpose the vapor deposition source therebetween and face each other. The vapor deposition source is a linear source or a point source.
申请公布号 KR100842183(B1) 申请公布日期 2008.06.30
申请号 KR20060138032 申请日期 2006.12.29
申请人 DOOSAN MECATEC CO., LTD. 发明人 LEE, DAE SOO;HAN, SEUNG HEON;LEE, KYOUNG OOK
分类号 H05B33/10 主分类号 H05B33/10
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