| 摘要 |
<p>The present invention provides a technique for obtaining overlay error and pattern placement error information from a single measurement structure (200) This is accomplished by forming periodic sub-structures (210, 220, 240, 250) in at least two different device layers in a single measurement structure (221,241), wherein at least one segmented (200) and one non-segmented (211,251) portion is provided in the two different device layers.</p> |
