| 摘要 |
An apparatus and a method for aligning a substrate and a mask are provided to improve precision of alignment by compensating a droop of the substrate before aligning the substrate and the mask. An apparatus for aligning a substrate and a mask includes a droop compensation device(20) for lifting a drooping region of the substrate. The droop compensation device includes a horizontal bar(21), a pin(22), and a driving unit(23). The horizontal bar is installed in a horizontal direction. The pin is projected toward an upper part of the horizontal bar. The driving unit lifts the horizontal bar. The driving unit transfers the horizontal bar to a region except a lower part of the mask to prevent interference of the horizontal bar in deposition. |
