| 摘要 |
<p>POLISHING COMPOSITION AND POLISHING METHOD To provide a polishing composition which is capable of selectively polishing a silicon oxide film against a polysilicon film, and a polishing method employing such a polishing composition.The polishing composition of the present invention comprises abrasive grains selected from silica and ceria; an alkali selected from ammonia, an ammonium salt, an alkali metal salt and an alkali metal hydroxide; and anorganic modified silicone oil selected from a polyoxyethylene-modified silicone oil, a poly(oxyethyleneoxypropylene)- modified silicone oil, an epoxy/polyether-modified silicone oil and an amino/polyether-modified silicone oil.</p> |
