发明名称 |
CONDUIT SYSTEM FOR A LITHOGRAPHIC APPARATUS, LITHOGRAPHIC APPARATUS, PUMP, AND METHOD FOR SUBSTANTIALLY REDUCING VIBRATIONS IN A CONDUIT SYSTEM |
摘要 |
<p>Conduit System for a Lithographic Apparatus, Lithographic Apparatus, Pump, and Method for Substantially Reducing Vibrations in a Conduit System A conduit system for a lithographic apparatus includes at least one conduit for guiding a liquid or liquid-gas mixture, and a gas injection nozzle configured to introduce a gas in the liquid or liquid-gas mixture to at least partially absorb pressure peaks or waves in said liquid or liquid-gas mixture. In an embodiment the gas injection nozzle may be arranged in a pump of the conduit system. The pump further includes a pump inlet, a pump outlet and a pump chamber between the pump inlet and the pump outlet for compression of the liquid or liquid-gas mixture.</p> |
申请公布号 |
SG143137(A1) |
申请公布日期 |
2008.06.27 |
申请号 |
SG20070172216 |
申请日期 |
2007.10.26 |
申请人 |
ASML NETHERLANDS B.V |
发明人 |
VAN DEN HEUVEL MARTINUS, WILHELMUS;FRANKEN JOHANNES, CHRISTIAAN, LEONARDUS;VUGTS JOSEPHUS, CORNELIUS, JOHANNES, ANTONIUS |
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