发明名称 SUBSTRATE FOR MAGNETIC RECORDING MEDIUM
摘要 <p>SUBSTRATE FOR MAGNETIC RECORDING MEDIUM The present invention provides a surface-treated substrate for a magnetic recording medium, and a magnetic recording medium comprising a recording layer, wherein the surface-treated substrate can contain thick film which has adhesion strong enough to withstand leveling process such as polishing in the formation of film on the Si substrate. More specifically, the present invention provides a surface- treated substrate for a magnetic recording medium, comprising a Si substrate and a primer plating layer on the Si substrate, wherein the primer plating layer is film which comprises a metal and a Si oxide. Furthermore, the present invention provides a surface-treated substrate for a magnetic recording medium, comprising a Si substrate and a primer plating layer on the Si substrate, wherein at least 5 and at most 50 protrusions of a height of at least 100 nm per are present on a surface of the primer plating layer. Even further, the present invention provides a surface-treated substrate for a magnetic recording medium, comprising a Si substrate, a primer plating layer on the Si substrate and a soft magnetic layer above the primer plating layer, wherein a non-magnetic middle layer is provided between the primer plating layer and the soft magnetic layer. Selected Drawing:</p>
申请公布号 SG143046(A1) 申请公布日期 2008.06.27
申请号 SG20040038642 申请日期 2004.06.25
申请人 SHIN-ETSU CHEMICAL CO., LTD. 发明人 ISHII MASATOSHI;TSUMORI TOSHIHIRO;HAMAGUCHI YU;JYOKO YUKIMI
分类号 G11B5/73;(IPC1-7):G11B5/72 主分类号 G11B5/73
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