A METHOD FOR PERFORMING FULL-CHIP MANUFACTURING RELIABILITY CHECKING AND CORRECTION AND A COMPUTER-READABLE RECORDING MEDIUM FOR RECORDING COMPUTER PROGRAM WHICH ACCOMPLISHES THEREOF

摘要

A method of determining the imagability of a mask pattern for use in an imaging process. The method includes the steps of: (a) obtaining a desired target pattern having a plurality of features; (b) simulating a wafer image of the mask pattern utilizing process parameters associated with a defined process; (c) defining at least one feature category; (d) identifying features in the target pattern that correspond to the at least one feature category, and recording an error value for each feature identified as corresponding to the at least one feature category; and (e) generating a statistical summary which indicates the error value for each feature identified as corresponding to the at least one feature category.