| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a process control system and a process control method that improve throughput of the whole manufacturing process while eliminating work executed by manpower. <P>SOLUTION: A server 3 monitors each state of inspection devices 1 so as to specify the inspection device 1 in an idle state. Subsequently, the server 3 outputs a control command, which instructs carrying-in of a wafer 6 into the inspection device 1 detected being in an idle state, to a substrate carrying-in control part 5. The substrate carrying-in control part 5 receiving the control command allows the wafer 6 to be carried-in into the inspection device 1 indicated by the control command. <P>COPYRIGHT: (C)2008,JPO&INPIT</p> |
