| 摘要 |
PROBLEM TO BE SOLVED: To provide a device and a method for distributing gas in a semiconductor processing chamber. SOLUTION: In one embodiment of the present invention, a gas distributor used in a gassing chamber has a body. The body includes a baffle, having gas deflection surfaces which divert the direction of gas flow, from a first direction to second directions. The gas deflecting surfaces have concave surfaces. The concave surfaces account for at least about 75% of the gas deflecting surfaces. Since the concave surfaces is made to deflect significantly toward the chamber walls the gas flow, contamination due to the metal atoms from the baffle is reduced, and thereby, the seasoning period can be shortened. COPYRIGHT: (C)2008,JPO&INPIT
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