METHOD AND DEVICE FOR MEASURING CRYSTALLIZATION RATE

摘要

PROBLEM TO BE SOLVED: To provide a method of measuring the crystallization rate of a semiconductor thin film, with high accuracy and in a short time. SOLUTION: The crystallization rate of a semiconductor thin film is measured, wherein a light L2 is emitted to the semiconductor thin film formed on a substrate; the light L2 including a wavelength that causes optical coherent resonance between the semiconductor thin film and the substrate; and then the intensity of transmitted light L3 of the light or the intensity of the reflected light of the light is measured. COPYRIGHT: (C)2008,JPO&INPIT