| 摘要 |
<P>PROBLEM TO BE SOLVED: To improve a throughput in exposure with a plurality of shots carried out using a proximity system. <P>SOLUTION: A proximity exposure device includes an exposure position to expose glass substrates 1a, 1b to transfer a pattern of a photomask 20, a plurality of stages to mount and move glass substrates 1a, 1b, and first and second loading positions to load the glass substrates 1a 1b onto the respective stages. The glass substrates 1a, 1b are repeatedly moved from the first and second loading positions to the single exposure position; the glass substrates 1a, 1b at the exposure position are moved in a plurality of steps in the direction of the X axis and Y axis; and each time of moving by a step, the glass substrates 1a, 1b are exposed to transfer the pattern of the photomask 20. <P>COPYRIGHT: (C)2008,JPO&INPIT |
