发明名称 METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE
摘要 <p><P>PROBLEM TO BE SOLVED: To make one semiconductor device correspond to a plurality of kinds of power supply voltages. <P>SOLUTION: In order to reduce the channel concentration by forming a pocket region 7 of the same conductivity type as that of a channel region 6, formed in between the source region 4 and the drain region 5 in a region adjacent to the source region 4, the region between the source region 4 and the drain region 5 is made into an asymmetrical concentration profile whose impurity concentration is high on the source region 4 side and low on the drain region 5 side. This reduces the current generated by impact ionization, when a drain bias is applied and improves the hot carrier resistance, by suppressing the characteristic deterioration due to hot carriers, to be made to correspond to a plurality of kinds of power supply voltages. <P>COPYRIGHT: (C)2008,JPO&INPIT</p>
申请公布号 JP2008147693(A) 申请公布日期 2008.06.26
申请号 JP20080015751 申请日期 2008.01.28
申请人 FUJITSU LTD 发明人 MOMIYAMA YOICHI
分类号 H01L29/78;H01L21/8234;H01L27/088 主分类号 H01L29/78
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