发明名称 IRRADIATION HEAD, AND ELECTRON MICROSCOPE EQUIPPED WITH THIS
摘要 PROBLEM TO BE SOLVED: To solve a problem that, although there is a method of making a gap between an objective lens and a sample microscopic in order to heighten resolution of an electron microscope, it is necessary to build a mechanism of static pressure flotation as well as a mechanism of differential exhaust between the objective lens and the sample on an irradiation head in case of one using local cacuum technology, but, incorporation of the mechanisms of static pressure flotation and differential exhaust makes it difficult to narrow the gap between the objective lens and the sample. SOLUTION: The objective lens 5 and the static pressure mechanism 18 of an irradiation head 50 are integrated and fixed. The differential exhaust mechanism 19 is arranged in a hollow part inside the objective lens, in free tilting movement, so that the mechanism of differential exhaust can follow unevenness and blurring of the sample. Further, a copying mechanism at a sample side is adopted to let the sample follow the objective lens. A gap between the objective lens and the sample of the electron microscope using a local vacuum technology is made microscopic to improve resolution. COPYRIGHT: (C)2008,JPO&INPIT
申请公布号 JP2008146890(A) 申请公布日期 2008.06.26
申请号 JP20060330092 申请日期 2006.12.07
申请人 SONY CORP 发明人 MUTO KOICHI
分类号 H01J37/18;H01J37/28 主分类号 H01J37/18
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