发明名称 MANUFACTURING METHOD OF NON-VOLATILE MEMORY
摘要 A non-volatile memory including at least a substrate, a memory cell and source/drain regions is provided. The memory cell is disposed on the substrate and includes at least a first memory unit and a second memory unit. Wherein, the first memory unit, from the substrate up, includes a floating gate and a first control gate. The second memory unit is disposed on a sidewall of the first memory unit and includes a charge trapping layer and a second control gate. The two source/drain regions are disposed in the substrate at both sides of the memory cell.
申请公布号 US2008153232(A1) 申请公布日期 2008.06.26
申请号 US20080043145 申请日期 2008.03.06
申请人 POWERCHIP SEMICONDUCTOR CORP. 发明人 WONG WEI-ZHE;YANG CHING-SUNG
分类号 H01L21/336 主分类号 H01L21/336
代理机构 代理人
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