| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a polishing cloth which achieves a substrate surface roughness of ≤0.2 nm, is free from scratch defects and ridge defects, and can form texture marks of a high line density. <P>SOLUTION: This polishing cloth is composed of a sheet-like article formed of an elastic polymer and a nonwoven fabric obtained by interlacing ultrafine polyamide fibers having an average single fiber fineness of 0.0001-0.02 dtex and a fineness CV in a range of 1 to 10% and/or ultrafine fiber bundles composed of the ultrafine fibers. In the polishing cloth, the intersections of the ultrafine fibers having a single fiber fineness of 0.0001-0.02 dtex and exposed to the surface exist at ≥150 places on average, when arbitrarily extracted ten 0.01 mm<SP>2</SP>ranges each having ≥50 ultrafine fibers are observed with a scanning electron microscope (SEM) of 2,000 magnifications. <P>COPYRIGHT: (C)2008,JPO&INPIT |
