| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a method of manufacturing a multilayer thin-film pattern and a display device capable of easily obtaining a pattern into a desired shape. <P>SOLUTION: The method of manufacturing a multilayer thin film pattern includes a process for forming a metal film 3 on a substrate,; a process for forming a second transparent conductive film 4 on the metal film 3,; a process for forming a resist pattern 5 on the second transparent conductive film 4; a process for etching the second transparent conductive film 4 via the resist pattern 5; a process for transforming the resist pattern 5 by using an organic solvent or a RELACS agent, to cover an edge face of the etched second transparent conductive film 4; and a process for etching the metal film 3, while the edge face of the second transparent conductive film 4 is covered with the resist pattern 5. <P>COPYRIGHT: (C)2008,JPO&INPIT</p> |
