| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a method of and an apparatus for producing polycrystalline silicon which can easily decompose and treat a polymer, suppress the loss of a chlorine source and maintain soundness of equipment. <P>SOLUTION: This method comprises a step of reacting trichlorosilane with hydrogen and producing silicon and an efflux comprising monosilanes (formula SiH<SB>n</SB>Cl<SB>4-n</SB>: n=0-4) including tetrachlorosilane and a polymer containing at least trisilanes and tetrasilanes, and a step of feeding the efflux and hydrogen into a conversion reactor 2 and heating at a temperature range of 600-1,400°C to react the tetrachlorosilane to be converted into trichlorosilane and the polymer to be converted into monosilanes. <P>COPYRIGHT: (C)2008,JPO&INPIT |
