发明名称 WAFER PROCESSING SYSTEM WITH DUAL WAFER ROBOTS CAPABLE OF ASYNCHRONOUS MOTION
摘要 A robot assembly for transferring substrates includes a central tube assembly oriented along a central axis, perpendicular to a substrate transfer plane, and having an inner surface that forms part of a first enclosure at a first pressure, and an outer surface that forms part of a second enclosure at a second, different pressure. The robot assembly further includes a transfer robot which itself includes multiple rotor assemblies, each configured to rotate parallel to the substrate transfer plane. The various rotor assemblies are organized in pairs, each pair having one rotor fitted with a telescoping support arm/end effector arrangement to support substrates thereon, and the other rotor fitted with inner and outer actuator arms that cooperate to effect radial movement of the corresponding end effector of the paired rotor assembly. Each rotor is controlled to effect the transfer of substrates within a wafer processing system asynchronously and at differing heights.
申请公布号 US2008152463(A1) 申请公布日期 2008.06.26
申请号 US20070863166 申请日期 2007.09.27
申请人 CHIDAMBARAM MAHENDRAN;TRUONG QUOC;SCHOCK JERRY;PARKER N WILLIAM 发明人 CHIDAMBARAM MAHENDRAN;TRUONG QUOC;SCHOCK JERRY;PARKER N. WILLIAM
分类号 H01L21/677 主分类号 H01L21/677
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