| 摘要 |
A chemical supply member and an apparatus for treating a substrate with the same are provided to heat process solution of a tank effectively by controlling power supply which is provided to heating coils so as to obtain large space and to prevent damage of a heating unit. A chemical supply member comprises a tank(22), and a heating unit(100). The tank stores process solution. The heating unit heats the process solution in the tank. The heating unit includes conductive bodies(110), and heaters(120). The conductive bodies are installed in the tank, and an insulator covers the outer part of the conductive bodies. The heaters are placed at the outer part of the tank to transmit heat to the conductive bodies. The heaters include heating bodies(122) and heating coils(124). The heating unit has a controller(130) controlling supply of power provided to the heating coils.
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