发明名称 PHOTOSENSITIVE RESIN COMPOSITION
摘要 A photosensitive resin composition, a pattern formed by using the composition, and a liquid crystal display device containing the pattern are provided to improve storage stability, surface smoothness, mechanical properties, heat resistance and solvent resistance. A photosensitive resin composition comprises a binder resin which is a copolymer of an unsaturated carboxylic acid and/or an unsaturated carboxylic anhydride and an aliphatic polycyclic epoxy compound; a photopolymerizable compound; a photopolymerization initiator; and a solvent. Preferably the aliphatic polycyclic epoxy compound is at least one selected from the compounds represented by the formulas I and II, wherein R is independently H or a C1-C4 alkyl group substituted with a hydroxyl group; and X is independently a single bond or a C1-C6-alkylene group capable of containing a hetero atom.
申请公布号 KR20080059048(A) 申请公布日期 2008.06.26
申请号 KR20070133117 申请日期 2007.12.18
申请人 SUMITOMO CHEMICAL CO., LTD. 发明人 INOUE KATSUHARU;TAKEBE KAZUO
分类号 G03F7/028 主分类号 G03F7/028
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